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Carbon nanotube pellicles for EUV lithography: form, function, and progress
In the early 2000s, membranes both thin enough to transmit EUV light and strong enough to be free-standing at mask dimensions did not exist. The lithography community assumed that defect control for photomasks would be achieved, but not with pellicle deployment. Starting with a 2006 Intel publication, an international development effort on EUV pellicle membranes has spanned a range of materials and fabrication approaches. Imec’s pellicle work based on carbon nanotubes (CNTs) started in 2015 and is placed in relation to the rich history of EUV pellicles. CNTs are one-atom-thick carbon sheets rolled into tubes. The CNTs can be single- or multi-walled and can vary in diameter, length, and density. Thus, the CNT membrane’s properties can be fundamentally changed to meet the EUV pellicle targets for properties like transmittance. The progress of pellicle development will be reported.

Speaker Biography:
Emily Gallagher is a Principal Member of Technical Staff at imec, focusing on pellicle membrane development, EUV imaging and photomasks, and sustainability in semiconductor manufacturing. Emily received her PhD in physics at Dartmouth College where she studied free electron lasers. After graduation, she joined IBM and became immersed in semiconductor technology. She held many wafer fabrication roles at IBM from functional characterization to process integration; the last was leading the EUV mask development effort. She joined imec in 2014. Emily has authored over 100 technical papers, holds over 20 patents, and is an SPIE Fellow.

This webinar is brought to you by BACUS, the international technical group of SPIE dedicated to the advancement of photomask technology.

Dec 14, 2022 08:00 AM in Pacific Time (US and Canada)

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